Heating and Sintering in Semiconductor Production with Infrared Lamps
Precise Process Heat for High Technology
In semiconductor manufacturing, thermal precision at the micro level is crucial for quality and yield. Infrared radiation (IR) has established itself as a key technology for contactless, precisely controllable heating. Whether for doping, layer sintering, or annealing processes, infrared lamps offer fast, homogeneous heat transfer and are ideal for sensitive materials and ultra-thin films.
Technical Basics
Efficient Heat Transfer through Infrared
Infrared emitters emit electromagnetic radiation in the range of 780 nm to 2 mm. The energy is converted directly into heat within the irradiated material – without heat loss to the air or surroundings. The following IR spectra are frequently used in semiconductor technology:
- Short-wave infrared (NIR): Particularly suitable for rapid, deep penetration into silicon wafers
- Medium-wave IR: Ideal for surface heating of thin film layers
- Halogen IR lamps: Highly dynamic temperature control with precise spot focus
The rapid controllability (within milliseconds) makes IR emitters ideal for sensitive thermal processes with tight tolerances.
Applications
Sintering, annealing, and thermal activation
Semiconductor manufacturing includes many thermally critical steps that IR technology efficiently supports:
Low- and High-Temperature Annealing:
- Recrystallization and Healing of Lattice Defects
- Activation of Implanted Dopants
Sintering of Contact Layers:
- Metallization Layers on Wafers, Glass Substrates, or Flexible Supports
- Thermal Densification and Anchoring without Distortion
Wafer Heating Before Subsequent Process Steps:
- Fast and Uniform Tempering Before Photolithography or Coating
- Temperature Profiling in Roll-to-Roll Processes for Flexible Electronics
Selective Heating / Zone Heating:
- Local Process Heat for Structured or Partial processing of components
By combining modular radiator arrays with precise control, heat can be directed precisely where it is needed – even on temperature-sensitive substrates such as glass, ceramics, or polymers.
Advantages of IR Heating in Semiconductor Technology
For manufacturers who demand high process reliability, cleanliness, and energy efficiency, infrared technology offers decisive advantages:
- Contactless energy input: No mechanical or chemical stress on the substrate
- Extremely fast response times: Ideal for clocked or sequential processes
- Precise temperature control: Thermal profiles can be precisely defined and reproduced
- No particle formation: Meets the highest requirements for cleanroom processes
- Compact integration: Space-saving retrofitting into existing production environments
- Low maintenance: Long service life and minimal downtime
The technology is available with different wavelengths, intensities, and geometries Adaptable – depending on the process and material.
Conclusion: Thermal Precision for Microelectronics – with IR Emitters
Infrared lamps enable thermal process control at the micrometer level – contactless, clean, and precisely controllable. In semiconductor technology, they are the key to faster cycle times, higher yields, and lower energy consumption. With Radium Tech, you rely on precise heat for high-tech processes.
Are you looking for thermal solutions for your production line? Our experts can help!
The Radium TECH Application Center supports you in the planning, design, and implementation of your IR processes – tailored to your materials, cycle times, and quality requirements.